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RCWA OCD

「RCWA OCD」文章包含有:「多角度分光光譜臨界尺寸測量儀」、「TWI631314B」、「OpticalCriticalDimensionMetrologyforSemiconductor...」、「基于RCWA模拟通过优化方位角提高OCD计量的灵敏度...」、「Rigorouscoupled」、「一种平行光微光斑光学关键尺寸分析装置及检测方法」、「SensitivityenhancementinOCDmetrologybyoptimizing...」、「Sensitivityanalysisofopticalscatterometrytechniquefor...」、「Opticalcriticaldimension(OCD)measurement...

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cd-sem是什麼scd量測原理半導體cd量測critical dimension半導體cd sem原理Hitachi CD-SEM光學關鍵尺寸critical dimension定義Optical critical dimensionCD-SEMcdsem半導體optical critical dimension原理
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多角度分光光譜臨界尺寸測量儀
多角度分光光譜臨界尺寸測量儀

https://www.quatek.com.tw

在線咨詢. 光學臨界尺寸(OCD)和高級膜分析計量 ... 多模式測量技術,用於在1x nm設計節點及更高級別進行即時多層堆疊特性分析和CD測量。 專有嚴格耦合波分析(RCWA)的多 ...

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TWI631314B
TWI631314B

https://patents.google.com

利用光學臨界尺寸(ocd)計量之結構分析用於光學參數模型之最佳化方法、非暫時性之機器可存取儲存媒體及用以產生所模擬繞射信號以利用光學計量判定用以在晶圓上製造結構 ...

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Optical Critical Dimension Metrology for Semiconductor ...
Optical Critical Dimension Metrology for Semiconductor ...

https://ontoinnovation.com

Data Analysis – RCWA and. Machine Learning. OCD is an indirect measurement. No analytical solution exists to derive the desired physical or material ...

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基于RCWA 模拟通过优化方位角提高OCD 计量的灵敏度 ...
基于RCWA 模拟通过优化方位角提高OCD 计量的灵敏度 ...

https://www.x-mol.com

使用光学临界尺寸(OCD) 计量的监控过程已针对所有模块执行了预先固定且未优化的方位角。方位角对光学灵敏度有很大影响,可以通过改变晶圆旋转轻松调整 ...

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Rigorous coupled
Rigorous coupled

https://en.wikipedia.org

Rigorous coupled-wave analysis (RCWA), also known as Fourier modal method (FMM), is a semi-analytical method in computational electromagnetics that is most ...

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一种平行光微光斑光学关键尺寸分析装置及检测方法
一种平行光微光斑光学关键尺寸分析装置及检测方法

https://patents.google.com

在半导体微电子领域中,由于侧重于对芯片关键尺寸的测量,该技术更多的被称为光学关键尺寸检测(OCD)。 ... RCWA/SAM检测方法与传统RCWA检测分析工具的区别。 样品表面结构如 ...

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Sensitivity enhancement in OCD metrology by optimizing ...
Sensitivity enhancement in OCD metrology by optimizing ...

https://www.sciencedirect.com

In this study, we suggest the optimal azimuth angle for both FinFET and MOSFET device based on the rigorous coupled wave analysis (RCWA). For FinFET device, the ...

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Sensitivity analysis of optical scatterometry technique for ...
Sensitivity analysis of optical scatterometry technique for ...

https://hal.science

In this article, the sensitivity of the OCD metrology technique is reported for given trenches geometry range: depth varying from 100 nm up to ...

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Optical critical dimension (OCD) measurements for profile ...
Optical critical dimension (OCD) measurements for profile ...

https://www.researchgate.net

The rigourous coupled wave analysis (RCWA) method provides an exact method for calculating the diffraction of electromagnetic waves by periodic grating ...